Low-temperature plasma pulsed deposition of thin films with nanoscale periodicity of properties

Film formation in low-temperature plasma in the pulsed mode was studied. The voltage’s pulse sequence in the sputtering system contained trains of short and long pulses; the short pulse time was chosen shorter than the stabilization time of the glow discharge mode. The formation of the nanoscale com...

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Bibliographic Details
Published in:Semiconductors (Woodbury, N.Y.) N.Y.), 2009-06, Vol.43 (6), p.828-831
Main Authors: Serdobintsev, A. A., Veselov, A. G., Kiryasova, O. A., Portnov, S. A., Bratashov, D. N.
Format: Article
Language:English
Subjects:
DEPOSITION
Fabrication
GLOW DISCHARGES
Magnetic Materials
Magnetism
MASS SPECTROSCOPY
MATERIALS SCIENCE
NANOSTRUCTURES
PERIODICITY
PHOTOLUMINESCENCE
Physics
Physics and Astronomy
PLASMA
PULSES
SPUTTERING
Testing of Materials and Structures
THIN FILMS
Treatment
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Summary:Film formation in low-temperature plasma in the pulsed mode was studied. The voltage’s pulse sequence in the sputtering system contained trains of short and long pulses; the short pulse time was chosen shorter than the stabilization time of the glow discharge mode. The formation of the nanoscale composition periodicity in grown films was confirmed by secondary-ion mass spectrometry. Photoluminescence of the films synthesized in the pulsed mode was studied, as well as the possibility of controlling the luminescence behavior and intensity.
ISSN:1063-7826
1090-6479
DOI:10.1134/S106378260906027X