Loading…

Low-temperature plasma pulsed deposition of thin films with nanoscale periodicity of properties

Film formation in low-temperature plasma in the pulsed mode was studied. The voltage’s pulse sequence in the sputtering system contained trains of short and long pulses; the short pulse time was chosen shorter than the stabilization time of the glow discharge mode. The formation of the nanoscale com...

Full description

Saved in:
Bibliographic Details
Published in:Semiconductors (Woodbury, N.Y.) N.Y.), 2009-06, Vol.43 (6), p.828-831
Main Authors: Serdobintsev, A. A., Veselov, A. G., Kiryasova, O. A., Portnov, S. A., Bratashov, D. N.
Format: Article
Language:English
Subjects:
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
cited_by cdi_FETCH-LOGICAL-c316t-6ce260eb33f32f94dde77699942100a7b6267639ef4fe5861703985dee4105363
cites cdi_FETCH-LOGICAL-c316t-6ce260eb33f32f94dde77699942100a7b6267639ef4fe5861703985dee4105363
container_end_page 831
container_issue 6
container_start_page 828
container_title Semiconductors (Woodbury, N.Y.)
container_volume 43
creator Serdobintsev, A. A.
Veselov, A. G.
Kiryasova, O. A.
Portnov, S. A.
Bratashov, D. N.
description Film formation in low-temperature plasma in the pulsed mode was studied. The voltage’s pulse sequence in the sputtering system contained trains of short and long pulses; the short pulse time was chosen shorter than the stabilization time of the glow discharge mode. The formation of the nanoscale composition periodicity in grown films was confirmed by secondary-ion mass spectrometry. Photoluminescence of the films synthesized in the pulsed mode was studied, as well as the possibility of controlling the luminescence behavior and intensity.
doi_str_mv 10.1134/S106378260906027X
format article
fullrecord <record><control><sourceid>crossref_osti_</sourceid><recordid>TN_cdi_osti_scitechconnect_21260337</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1134_S106378260906027X</sourcerecordid><originalsourceid>FETCH-LOGICAL-c316t-6ce260eb33f32f94dde77699942100a7b6267639ef4fe5861703985dee4105363</originalsourceid><addsrcrecordid>eNp9UE1LxDAUDKLguvoDvAU8V5OmTZqjLH7BggcVvIVs-uJmaZOSZFn896asN8HTG96bGeYNQteU3FLKmrs3SjgTXc2JJJzU4vMELWjBFW-EPJ0xZ9V8P0cXKe0IobRrmwVS63CoMowTRJ33EfA06DRqPO2HBD3uYQrJZRc8DhbnrfPYumFM-ODyFnvtQzJ6KCqILvTOuPw9E6cYyiY7SJfozOpidfU7l-jj8eF99VytX59eVvfryjDKc8UNlOiwYcyy2sqm70EILqVsakqIFhtec8GZBNtYaDtOBWGya3uAhpKWcbZEN0ffkLJTqQQBszXBezBZ1bSYMyYKix5ZJoaUIlg1RTfq-K0oUXOP6k-PRVMfNalw_RdEtQv76Msz_4h-AJvudVQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Low-temperature plasma pulsed deposition of thin films with nanoscale periodicity of properties</title><source>Springer Link</source><creator>Serdobintsev, A. A. ; Veselov, A. G. ; Kiryasova, O. A. ; Portnov, S. A. ; Bratashov, D. N.</creator><creatorcontrib>Serdobintsev, A. A. ; Veselov, A. G. ; Kiryasova, O. A. ; Portnov, S. A. ; Bratashov, D. N.</creatorcontrib><description>Film formation in low-temperature plasma in the pulsed mode was studied. The voltage’s pulse sequence in the sputtering system contained trains of short and long pulses; the short pulse time was chosen shorter than the stabilization time of the glow discharge mode. The formation of the nanoscale composition periodicity in grown films was confirmed by secondary-ion mass spectrometry. Photoluminescence of the films synthesized in the pulsed mode was studied, as well as the possibility of controlling the luminescence behavior and intensity.</description><identifier>ISSN: 1063-7826</identifier><identifier>EISSN: 1090-6479</identifier><identifier>DOI: 10.1134/S106378260906027X</identifier><language>eng</language><publisher>Dordrecht: SP MAIK Nauka/Interperiodica</publisher><subject>DEPOSITION ; Fabrication ; GLOW DISCHARGES ; Magnetic Materials ; Magnetism ; MASS SPECTROSCOPY ; MATERIALS SCIENCE ; NANOSTRUCTURES ; PERIODICITY ; PHOTOLUMINESCENCE ; Physics ; Physics and Astronomy ; PLASMA ; PULSES ; SPUTTERING ; Testing of Materials and Structures ; THIN FILMS ; Treatment</subject><ispartof>Semiconductors (Woodbury, N.Y.), 2009-06, Vol.43 (6), p.828-831</ispartof><rights>Pleiades Publishing, Ltd. 2009</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c316t-6ce260eb33f32f94dde77699942100a7b6267639ef4fe5861703985dee4105363</citedby><cites>FETCH-LOGICAL-c316t-6ce260eb33f32f94dde77699942100a7b6267639ef4fe5861703985dee4105363</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,780,784,885,27924,27925</link.rule.ids><backlink>$$Uhttps://www.osti.gov/biblio/21260337$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Serdobintsev, A. A.</creatorcontrib><creatorcontrib>Veselov, A. G.</creatorcontrib><creatorcontrib>Kiryasova, O. A.</creatorcontrib><creatorcontrib>Portnov, S. A.</creatorcontrib><creatorcontrib>Bratashov, D. N.</creatorcontrib><title>Low-temperature plasma pulsed deposition of thin films with nanoscale periodicity of properties</title><title>Semiconductors (Woodbury, N.Y.)</title><addtitle>Semiconductors</addtitle><description>Film formation in low-temperature plasma in the pulsed mode was studied. The voltage’s pulse sequence in the sputtering system contained trains of short and long pulses; the short pulse time was chosen shorter than the stabilization time of the glow discharge mode. The formation of the nanoscale composition periodicity in grown films was confirmed by secondary-ion mass spectrometry. Photoluminescence of the films synthesized in the pulsed mode was studied, as well as the possibility of controlling the luminescence behavior and intensity.</description><subject>DEPOSITION</subject><subject>Fabrication</subject><subject>GLOW DISCHARGES</subject><subject>Magnetic Materials</subject><subject>Magnetism</subject><subject>MASS SPECTROSCOPY</subject><subject>MATERIALS SCIENCE</subject><subject>NANOSTRUCTURES</subject><subject>PERIODICITY</subject><subject>PHOTOLUMINESCENCE</subject><subject>Physics</subject><subject>Physics and Astronomy</subject><subject>PLASMA</subject><subject>PULSES</subject><subject>SPUTTERING</subject><subject>Testing of Materials and Structures</subject><subject>THIN FILMS</subject><subject>Treatment</subject><issn>1063-7826</issn><issn>1090-6479</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><recordid>eNp9UE1LxDAUDKLguvoDvAU8V5OmTZqjLH7BggcVvIVs-uJmaZOSZFn896asN8HTG96bGeYNQteU3FLKmrs3SjgTXc2JJJzU4vMELWjBFW-EPJ0xZ9V8P0cXKe0IobRrmwVS63CoMowTRJ33EfA06DRqPO2HBD3uYQrJZRc8DhbnrfPYumFM-ODyFnvtQzJ6KCqILvTOuPw9E6cYyiY7SJfozOpidfU7l-jj8eF99VytX59eVvfryjDKc8UNlOiwYcyy2sqm70EILqVsakqIFhtec8GZBNtYaDtOBWGya3uAhpKWcbZEN0ffkLJTqQQBszXBezBZ1bSYMyYKix5ZJoaUIlg1RTfq-K0oUXOP6k-PRVMfNalw_RdEtQv76Msz_4h-AJvudVQ</recordid><startdate>20090601</startdate><enddate>20090601</enddate><creator>Serdobintsev, A. A.</creator><creator>Veselov, A. G.</creator><creator>Kiryasova, O. A.</creator><creator>Portnov, S. A.</creator><creator>Bratashov, D. N.</creator><general>SP MAIK Nauka/Interperiodica</general><scope>AAYXX</scope><scope>CITATION</scope><scope>OTOTI</scope></search><sort><creationdate>20090601</creationdate><title>Low-temperature plasma pulsed deposition of thin films with nanoscale periodicity of properties</title><author>Serdobintsev, A. A. ; Veselov, A. G. ; Kiryasova, O. A. ; Portnov, S. A. ; Bratashov, D. N.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c316t-6ce260eb33f32f94dde77699942100a7b6267639ef4fe5861703985dee4105363</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><topic>DEPOSITION</topic><topic>Fabrication</topic><topic>GLOW DISCHARGES</topic><topic>Magnetic Materials</topic><topic>Magnetism</topic><topic>MASS SPECTROSCOPY</topic><topic>MATERIALS SCIENCE</topic><topic>NANOSTRUCTURES</topic><topic>PERIODICITY</topic><topic>PHOTOLUMINESCENCE</topic><topic>Physics</topic><topic>Physics and Astronomy</topic><topic>PLASMA</topic><topic>PULSES</topic><topic>SPUTTERING</topic><topic>Testing of Materials and Structures</topic><topic>THIN FILMS</topic><topic>Treatment</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Serdobintsev, A. A.</creatorcontrib><creatorcontrib>Veselov, A. G.</creatorcontrib><creatorcontrib>Kiryasova, O. A.</creatorcontrib><creatorcontrib>Portnov, S. A.</creatorcontrib><creatorcontrib>Bratashov, D. N.</creatorcontrib><collection>CrossRef</collection><collection>OSTI.GOV</collection><jtitle>Semiconductors (Woodbury, N.Y.)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Serdobintsev, A. A.</au><au>Veselov, A. G.</au><au>Kiryasova, O. A.</au><au>Portnov, S. A.</au><au>Bratashov, D. N.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Low-temperature plasma pulsed deposition of thin films with nanoscale periodicity of properties</atitle><jtitle>Semiconductors (Woodbury, N.Y.)</jtitle><stitle>Semiconductors</stitle><date>2009-06-01</date><risdate>2009</risdate><volume>43</volume><issue>6</issue><spage>828</spage><epage>831</epage><pages>828-831</pages><issn>1063-7826</issn><eissn>1090-6479</eissn><abstract>Film formation in low-temperature plasma in the pulsed mode was studied. The voltage’s pulse sequence in the sputtering system contained trains of short and long pulses; the short pulse time was chosen shorter than the stabilization time of the glow discharge mode. The formation of the nanoscale composition periodicity in grown films was confirmed by secondary-ion mass spectrometry. Photoluminescence of the films synthesized in the pulsed mode was studied, as well as the possibility of controlling the luminescence behavior and intensity.</abstract><cop>Dordrecht</cop><pub>SP MAIK Nauka/Interperiodica</pub><doi>10.1134/S106378260906027X</doi><tpages>4</tpages></addata></record>
fulltext fulltext
identifier ISSN: 1063-7826
ispartof Semiconductors (Woodbury, N.Y.), 2009-06, Vol.43 (6), p.828-831
issn 1063-7826
1090-6479
language eng
recordid cdi_osti_scitechconnect_21260337
source Springer Link
subjects DEPOSITION
Fabrication
GLOW DISCHARGES
Magnetic Materials
Magnetism
MASS SPECTROSCOPY
MATERIALS SCIENCE
NANOSTRUCTURES
PERIODICITY
PHOTOLUMINESCENCE
Physics
Physics and Astronomy
PLASMA
PULSES
SPUTTERING
Testing of Materials and Structures
THIN FILMS
Treatment
title Low-temperature plasma pulsed deposition of thin films with nanoscale periodicity of properties
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-07T15%3A59%3A55IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref_osti_&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Low-temperature%20plasma%20pulsed%20deposition%20of%20thin%20films%20with%20nanoscale%20periodicity%20of%20properties&rft.jtitle=Semiconductors%20(Woodbury,%20N.Y.)&rft.au=Serdobintsev,%20A.%20A.&rft.date=2009-06-01&rft.volume=43&rft.issue=6&rft.spage=828&rft.epage=831&rft.pages=828-831&rft.issn=1063-7826&rft.eissn=1090-6479&rft_id=info:doi/10.1134/S106378260906027X&rft_dat=%3Ccrossref_osti_%3E10_1134_S106378260906027X%3C/crossref_osti_%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c316t-6ce260eb33f32f94dde77699942100a7b6267639ef4fe5861703985dee4105363%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true