Loading…
Low-temperature plasma pulsed deposition of thin films with nanoscale periodicity of properties
Film formation in low-temperature plasma in the pulsed mode was studied. The voltage’s pulse sequence in the sputtering system contained trains of short and long pulses; the short pulse time was chosen shorter than the stabilization time of the glow discharge mode. The formation of the nanoscale com...
Saved in:
Published in: | Semiconductors (Woodbury, N.Y.) N.Y.), 2009-06, Vol.43 (6), p.828-831 |
---|---|
Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
cited_by | cdi_FETCH-LOGICAL-c316t-6ce260eb33f32f94dde77699942100a7b6267639ef4fe5861703985dee4105363 |
---|---|
cites | cdi_FETCH-LOGICAL-c316t-6ce260eb33f32f94dde77699942100a7b6267639ef4fe5861703985dee4105363 |
container_end_page | 831 |
container_issue | 6 |
container_start_page | 828 |
container_title | Semiconductors (Woodbury, N.Y.) |
container_volume | 43 |
creator | Serdobintsev, A. A. Veselov, A. G. Kiryasova, O. A. Portnov, S. A. Bratashov, D. N. |
description | Film formation in low-temperature plasma in the pulsed mode was studied. The voltage’s pulse sequence in the sputtering system contained trains of short and long pulses; the short pulse time was chosen shorter than the stabilization time of the glow discharge mode. The formation of the nanoscale composition periodicity in grown films was confirmed by secondary-ion mass spectrometry. Photoluminescence of the films synthesized in the pulsed mode was studied, as well as the possibility of controlling the luminescence behavior and intensity. |
doi_str_mv | 10.1134/S106378260906027X |
format | article |
fullrecord | <record><control><sourceid>crossref_osti_</sourceid><recordid>TN_cdi_osti_scitechconnect_21260337</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1134_S106378260906027X</sourcerecordid><originalsourceid>FETCH-LOGICAL-c316t-6ce260eb33f32f94dde77699942100a7b6267639ef4fe5861703985dee4105363</originalsourceid><addsrcrecordid>eNp9UE1LxDAUDKLguvoDvAU8V5OmTZqjLH7BggcVvIVs-uJmaZOSZFn896asN8HTG96bGeYNQteU3FLKmrs3SjgTXc2JJJzU4vMELWjBFW-EPJ0xZ9V8P0cXKe0IobRrmwVS63CoMowTRJ33EfA06DRqPO2HBD3uYQrJZRc8DhbnrfPYumFM-ODyFnvtQzJ6KCqILvTOuPw9E6cYyiY7SJfozOpidfU7l-jj8eF99VytX59eVvfryjDKc8UNlOiwYcyy2sqm70EILqVsakqIFhtec8GZBNtYaDtOBWGya3uAhpKWcbZEN0ffkLJTqQQBszXBezBZ1bSYMyYKix5ZJoaUIlg1RTfq-K0oUXOP6k-PRVMfNalw_RdEtQv76Msz_4h-AJvudVQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Low-temperature plasma pulsed deposition of thin films with nanoscale periodicity of properties</title><source>Springer Link</source><creator>Serdobintsev, A. A. ; Veselov, A. G. ; Kiryasova, O. A. ; Portnov, S. A. ; Bratashov, D. N.</creator><creatorcontrib>Serdobintsev, A. A. ; Veselov, A. G. ; Kiryasova, O. A. ; Portnov, S. A. ; Bratashov, D. N.</creatorcontrib><description>Film formation in low-temperature plasma in the pulsed mode was studied. The voltage’s pulse sequence in the sputtering system contained trains of short and long pulses; the short pulse time was chosen shorter than the stabilization time of the glow discharge mode. The formation of the nanoscale composition periodicity in grown films was confirmed by secondary-ion mass spectrometry. Photoluminescence of the films synthesized in the pulsed mode was studied, as well as the possibility of controlling the luminescence behavior and intensity.</description><identifier>ISSN: 1063-7826</identifier><identifier>EISSN: 1090-6479</identifier><identifier>DOI: 10.1134/S106378260906027X</identifier><language>eng</language><publisher>Dordrecht: SP MAIK Nauka/Interperiodica</publisher><subject>DEPOSITION ; Fabrication ; GLOW DISCHARGES ; Magnetic Materials ; Magnetism ; MASS SPECTROSCOPY ; MATERIALS SCIENCE ; NANOSTRUCTURES ; PERIODICITY ; PHOTOLUMINESCENCE ; Physics ; Physics and Astronomy ; PLASMA ; PULSES ; SPUTTERING ; Testing of Materials and Structures ; THIN FILMS ; Treatment</subject><ispartof>Semiconductors (Woodbury, N.Y.), 2009-06, Vol.43 (6), p.828-831</ispartof><rights>Pleiades Publishing, Ltd. 2009</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c316t-6ce260eb33f32f94dde77699942100a7b6267639ef4fe5861703985dee4105363</citedby><cites>FETCH-LOGICAL-c316t-6ce260eb33f32f94dde77699942100a7b6267639ef4fe5861703985dee4105363</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,780,784,885,27924,27925</link.rule.ids><backlink>$$Uhttps://www.osti.gov/biblio/21260337$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Serdobintsev, A. A.</creatorcontrib><creatorcontrib>Veselov, A. G.</creatorcontrib><creatorcontrib>Kiryasova, O. A.</creatorcontrib><creatorcontrib>Portnov, S. A.</creatorcontrib><creatorcontrib>Bratashov, D. N.</creatorcontrib><title>Low-temperature plasma pulsed deposition of thin films with nanoscale periodicity of properties</title><title>Semiconductors (Woodbury, N.Y.)</title><addtitle>Semiconductors</addtitle><description>Film formation in low-temperature plasma in the pulsed mode was studied. The voltage’s pulse sequence in the sputtering system contained trains of short and long pulses; the short pulse time was chosen shorter than the stabilization time of the glow discharge mode. The formation of the nanoscale composition periodicity in grown films was confirmed by secondary-ion mass spectrometry. Photoluminescence of the films synthesized in the pulsed mode was studied, as well as the possibility of controlling the luminescence behavior and intensity.</description><subject>DEPOSITION</subject><subject>Fabrication</subject><subject>GLOW DISCHARGES</subject><subject>Magnetic Materials</subject><subject>Magnetism</subject><subject>MASS SPECTROSCOPY</subject><subject>MATERIALS SCIENCE</subject><subject>NANOSTRUCTURES</subject><subject>PERIODICITY</subject><subject>PHOTOLUMINESCENCE</subject><subject>Physics</subject><subject>Physics and Astronomy</subject><subject>PLASMA</subject><subject>PULSES</subject><subject>SPUTTERING</subject><subject>Testing of Materials and Structures</subject><subject>THIN FILMS</subject><subject>Treatment</subject><issn>1063-7826</issn><issn>1090-6479</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><recordid>eNp9UE1LxDAUDKLguvoDvAU8V5OmTZqjLH7BggcVvIVs-uJmaZOSZFn896asN8HTG96bGeYNQteU3FLKmrs3SjgTXc2JJJzU4vMELWjBFW-EPJ0xZ9V8P0cXKe0IobRrmwVS63CoMowTRJ33EfA06DRqPO2HBD3uYQrJZRc8DhbnrfPYumFM-ODyFnvtQzJ6KCqILvTOuPw9E6cYyiY7SJfozOpidfU7l-jj8eF99VytX59eVvfryjDKc8UNlOiwYcyy2sqm70EILqVsakqIFhtec8GZBNtYaDtOBWGya3uAhpKWcbZEN0ffkLJTqQQBszXBezBZ1bSYMyYKix5ZJoaUIlg1RTfq-K0oUXOP6k-PRVMfNalw_RdEtQv76Msz_4h-AJvudVQ</recordid><startdate>20090601</startdate><enddate>20090601</enddate><creator>Serdobintsev, A. A.</creator><creator>Veselov, A. G.</creator><creator>Kiryasova, O. A.</creator><creator>Portnov, S. A.</creator><creator>Bratashov, D. N.</creator><general>SP MAIK Nauka/Interperiodica</general><scope>AAYXX</scope><scope>CITATION</scope><scope>OTOTI</scope></search><sort><creationdate>20090601</creationdate><title>Low-temperature plasma pulsed deposition of thin films with nanoscale periodicity of properties</title><author>Serdobintsev, A. A. ; Veselov, A. G. ; Kiryasova, O. A. ; Portnov, S. A. ; Bratashov, D. N.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c316t-6ce260eb33f32f94dde77699942100a7b6267639ef4fe5861703985dee4105363</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><topic>DEPOSITION</topic><topic>Fabrication</topic><topic>GLOW DISCHARGES</topic><topic>Magnetic Materials</topic><topic>Magnetism</topic><topic>MASS SPECTROSCOPY</topic><topic>MATERIALS SCIENCE</topic><topic>NANOSTRUCTURES</topic><topic>PERIODICITY</topic><topic>PHOTOLUMINESCENCE</topic><topic>Physics</topic><topic>Physics and Astronomy</topic><topic>PLASMA</topic><topic>PULSES</topic><topic>SPUTTERING</topic><topic>Testing of Materials and Structures</topic><topic>THIN FILMS</topic><topic>Treatment</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Serdobintsev, A. A.</creatorcontrib><creatorcontrib>Veselov, A. G.</creatorcontrib><creatorcontrib>Kiryasova, O. A.</creatorcontrib><creatorcontrib>Portnov, S. A.</creatorcontrib><creatorcontrib>Bratashov, D. N.</creatorcontrib><collection>CrossRef</collection><collection>OSTI.GOV</collection><jtitle>Semiconductors (Woodbury, N.Y.)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Serdobintsev, A. A.</au><au>Veselov, A. G.</au><au>Kiryasova, O. A.</au><au>Portnov, S. A.</au><au>Bratashov, D. N.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Low-temperature plasma pulsed deposition of thin films with nanoscale periodicity of properties</atitle><jtitle>Semiconductors (Woodbury, N.Y.)</jtitle><stitle>Semiconductors</stitle><date>2009-06-01</date><risdate>2009</risdate><volume>43</volume><issue>6</issue><spage>828</spage><epage>831</epage><pages>828-831</pages><issn>1063-7826</issn><eissn>1090-6479</eissn><abstract>Film formation in low-temperature plasma in the pulsed mode was studied. The voltage’s pulse sequence in the sputtering system contained trains of short and long pulses; the short pulse time was chosen shorter than the stabilization time of the glow discharge mode. The formation of the nanoscale composition periodicity in grown films was confirmed by secondary-ion mass spectrometry. Photoluminescence of the films synthesized in the pulsed mode was studied, as well as the possibility of controlling the luminescence behavior and intensity.</abstract><cop>Dordrecht</cop><pub>SP MAIK Nauka/Interperiodica</pub><doi>10.1134/S106378260906027X</doi><tpages>4</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 1063-7826 |
ispartof | Semiconductors (Woodbury, N.Y.), 2009-06, Vol.43 (6), p.828-831 |
issn | 1063-7826 1090-6479 |
language | eng |
recordid | cdi_osti_scitechconnect_21260337 |
source | Springer Link |
subjects | DEPOSITION Fabrication GLOW DISCHARGES Magnetic Materials Magnetism MASS SPECTROSCOPY MATERIALS SCIENCE NANOSTRUCTURES PERIODICITY PHOTOLUMINESCENCE Physics Physics and Astronomy PLASMA PULSES SPUTTERING Testing of Materials and Structures THIN FILMS Treatment |
title | Low-temperature plasma pulsed deposition of thin films with nanoscale periodicity of properties |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-07T15%3A59%3A55IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref_osti_&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Low-temperature%20plasma%20pulsed%20deposition%20of%20thin%20films%20with%20nanoscale%20periodicity%20of%20properties&rft.jtitle=Semiconductors%20(Woodbury,%20N.Y.)&rft.au=Serdobintsev,%20A.%20A.&rft.date=2009-06-01&rft.volume=43&rft.issue=6&rft.spage=828&rft.epage=831&rft.pages=828-831&rft.issn=1063-7826&rft.eissn=1090-6479&rft_id=info:doi/10.1134/S106378260906027X&rft_dat=%3Ccrossref_osti_%3E10_1134_S106378260906027X%3C/crossref_osti_%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c316t-6ce260eb33f32f94dde77699942100a7b6267639ef4fe5861703985dee4105363%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |