Studies of chlorine-oxygen plasmas and evidence for heterogeneous formation of ClO and ClO{sub 2}

Plasma and surface diagnostics of Cl{sub 2}/O{sub 2} mixed-gas inductively coupled plasmas are reported. Using trace rare gas optical emission spectroscopy and Langmuir probe analysis, electron temperatures (T{sub e}) and number densities for Cl atoms (n{sub Cl}), electrons (n{sub e}), and positive...

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Bibliographic Details
Published in:Journal of applied physics 2009-06, Vol.105 (11)
Main Authors: Guha, Joydeep, Donnelly, Vincent M.
Format: Article
Language:English
Subjects:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ADSORPTION
ALUMINIUM
AUGER ELECTRON SPECTROSCOPY
BEAM-PLASMA SYSTEMS
CATIONS
CHALCOGENIDES
CHARGED PARTICLES
CHLORINE
CHLORINE COMPOUNDS
CHLORINE OXIDES
DIMENSIONLESS NUMBERS
ELECTRIC PROBES
ELECTRON SPECTROMETERS
ELECTRON SPECTROSCOPY
ELECTRON TEMPERATURE
ELEMENTS
EMISSION SPECTROSCOPY
HALOGEN COMPOUNDS
HALOGENS
IONS
LANGMUIR PROBE
MASS SPECTROMETERS
MASS SPECTROSCOPY
MEASURING INSTRUMENTS
METALS
MIXING RATIO
NONMETALS
OXIDES
OXYGEN
OXYGEN COMPOUNDS
PLASMA
PLASMA DIAGNOSTICS
PROBABILITY
PROBES
RECOMBINATION
SORPTION
SPECTROMETERS
SPECTROSCOPY
SUBSTRATES
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Summary:Plasma and surface diagnostics of Cl{sub 2}/O{sub 2} mixed-gas inductively coupled plasmas are reported. Using trace rare gas optical emission spectroscopy and Langmuir probe analysis, electron temperatures (T{sub e}) and number densities for Cl atoms (n{sub Cl}), electrons (n{sub e}), and positive ions were measured as a function of percent O{sub 2} in the feed gas and position in the plasma chamber. Adsorbates on and products desorbing from a rotating anodized aluminum substrate exposed to the plasma were detected with an Auger electron spectrometer and a quadrupole mass spectrometer. T{sub e} and n{sub e} increased with increasing percent O{sub 2} in the plasma, while n{sub Cl} fell off with O{sub 2} addition in a manner reflecting simple dilution. Cl atom recombination probabilities (gamma{sub Cl}) were measured and were found to be a nearly constant 0.036+-0.007 over the range of Cl{sub 2}/O{sub 2} mixing ratios and Cl coverage. Large yields of ClO and ClO{sub 2} were found to desorb from the surface during exposure to the plasma, ascribed predominantly to Langmuir-Hinshelwood reactions between adsorbed O and Cl.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.3129543