Study of the spatial resolution of laser thermochemical technology for recording diffraction microstructures

The thermochemical method for recording data, which is based on local laser oxidation of a thin metal film with subsequent etching of the unirradiated region, is an alternative to laser photolithography and direct laser removal of the film material. This recording technology is characterised by the...

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Bibliographic Details
Published in:Quantum electronics (Woodbury, N.Y.) N.Y.), 2011-07, Vol.41 (7), p.631-636
Main Authors: Veiko, V P, Korol'kov, V I, Poleshchuk, A G, Sametov, A R, Shakhno, E A, Yarchuk, M V
Format: Article
Language:English
Subjects:
ABLATION
CHEMICAL REACTIONS
CHROMIUM
COHERENT SCATTERING
CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
DIFFRACTION
ELEMENTS
ETCHING
LASERS
METALS
MICROSTRUCTURE
OXIDATION
RESOLUTION
SCATTERING
SPATIAL RESOLUTION
SURFACE FINISHING
THERMOCHEMICAL PROCESSES
THIN FILMS
TRANSITION ELEMENTS
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Summary:The thermochemical method for recording data, which is based on local laser oxidation of a thin metal film with subsequent etching of the unirradiated region, is an alternative to laser photolithography and direct laser removal of the film material. This recording technology is characterised by the absence of thermal and hydrodynamic image distortions, as in the case of laser ablation, and the number of necessary technological operations is much smaller as compared with the photomask preparation in classical photolithography. The main field of application of the thermochemical technology is the fabrication of diffraction optical elements (DOEs), which are widely used in printers, bar-code readers, CD and DVD laser players, etc. The purpose of this study is to increase the resolution of thermochemical data recording on thin chromium films. (interaction of laser radiation with matter)
ISSN:1063-7818
1468-4799
DOI:10.1070/QE2011v041n07ABEH014528