The Measurement of MTFs in X-ray Microscopy Using Diffractograms

A novel method to characterize the optical performance of a high-resolution transmission x-ray microscope is presented. It makes use of test patterns that consist of random arrays of sub-resolution holes in a thin metal film, and so approximate to white-noise input signals for the microscope. The te...

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Bibliographic Details
Main Authors: Morrison, G. R., Charalambous, P. S., Gianoncelli, A., Kaulich, B.
Format: Conference Proceeding
Language:English
Subjects:
07 ISOTOPES AND RADIATION SOURCES
APPROXIMATIONS
BEAMS
CALCULATION METHODS
DATA PROCESSING
ELECTROMAGNETIC RADIATION
ELECTRON BEAMS
ELECTRON MICROSCOPY
ELEMENTS
FUNCTIONS
IONIZING RADIATIONS
LEPTON BEAMS
MATERIALS SCIENCE
METALS
MICROSCOPES
MICROSCOPY
NOISE
OPTICAL SYSTEMS
PARTICLE BEAMS
PROCESSING
RADIATION SOURCES
RADIATIONS
RESOLUTION
THIN FILMS
TRANSFER FUNCTIONS
TRANSMISSION ELECTRON MICROSCOPY
X RADIATION
X-RAY SOURCES
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Description
Summary:A novel method to characterize the optical performance of a high-resolution transmission x-ray microscope is presented. It makes use of test patterns that consist of random arrays of sub-resolution holes in a thin metal film, and so approximate to white-noise input signals for the microscope. The test patterns have been fabricated by electron-beam lithography at length scales appropriate for the resolution available in x-ray microscopy, so that diffractograms produced from the image data can be directly interpreted in terms of the contrast transfer function of the optical system. Results of this method are shown for both brightfield and differential phase contrast imaging.
ISSN:0094-243X
1551-7616
DOI:10.1063/1.3625357