TSOM Method for Nanoelectronics Dimensional Metrology

Through-focus scanning optical microscopy (TSOM) is a relatively new method that transforms conventional optical microscopes into truly three-dimensional metrology tools for nanoscale to microscale dimensional analysis. TSOM achieves this by acquiring and analyzing a set of optical images collected...

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Bibliographic Details
Main Author: Attota, Ravikiran
Format: Conference Proceeding
Language:English
Subjects:
ATOMIC FORCE MICROSCOPY
COMPUTERIZED SIMULATION
DIFFRACTION GRATINGS
ELECTROMECHANICS
ELECTRON MICROSCOPY
ILLUMINANCE
IMAGE PROCESSING
MATERIALS
MATERIALS SCIENCE
MEASURING METHODS
MECHANICS
MICROSCOPES
MICROSCOPY
MICROSTRUCTURE
NANOSCIENCE AND NANOTECHNOLOGY
NANOSTRUCTURES
OPTICAL MICROSCOPES
OPTICAL MICROSCOPY
PROCESSING
RESOLUTION
SCANNING ELECTRON MICROSCOPY
SCANNING LIGHT MICROSCOPY
SEMICONDUCTOR MATERIALS
SENSITIVITY
SIMULATION
THREE-DIMENSIONAL CALCULATIONS
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Description
Summary:Through-focus scanning optical microscopy (TSOM) is a relatively new method that transforms conventional optical microscopes into truly three-dimensional metrology tools for nanoscale to microscale dimensional analysis. TSOM achieves this by acquiring and analyzing a set of optical images collected at various focus positions going through focus (from above-focus to under-focus). The measurement resolution is comparable to what is possible with typical light scatterometry, scanning electron microscopy (SEM) and atomic force microscopy (AFM). TSOM method is able to identify nanometer scale difference, type of the difference and magnitude of the difference between two nano/micro scale targets using a conventional optical microscope with visible wavelength illumination. Numerous industries could benefit from the TSOM method--such as the semiconductor industry, MEMS, NEMS, biotechnology, nanomanufacturing, data storage, and photonics. The method is relatively simple and inexpensive, has a high throughput, provides nanoscale sensitivity for 3D measurements and could enable significant savings and yield improvements in nanometrology and nanomanufacturing. Potential applications are demonstrated using experiments and simulations.
ISSN:0094-243X
1551-7616
DOI:10.1063/1.3657866