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Effect of fast positive ions incident on caesiated plasma grid of negative ion source

This paper describes the effect on negative ion formation on a caesiated surface of the backscattering of positive ions approaching it with energy of a few tens of eV. For a positive ion energy of 45 eV, the surface produced negative ion current density due to these fast positive ions is 12 times la...

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Bibliographic Details
Published in:Review of scientific instruments 2012-02, Vol.83 (2), p.02B101-02B101-3
Main Author: Bacal, M.
Format: Article
Language:English
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Summary:This paper describes the effect on negative ion formation on a caesiated surface of the backscattering of positive ions approaching it with energy of a few tens of eV. For a positive ion energy of 45 eV, the surface produced negative ion current density due to these fast positive ions is 12 times larger than that due to thermal atoms, thus dominating the negative ion surface production instead of the thermal atoms, as considered until now.
ISSN:0034-6748
1089-7623
DOI:10.1063/1.3656076