Refractive index gradient measurement across the thickness of a dielectric film by the prism coupling method

A method is proposed for measuring the refractive index gradient n(z) in nonuniformly thick dielectric films. The method is based on the excitation of waveguide modes in a film using the prism coupling technique and on the calculation of n(z) and film thickness H{sub f} with the help of the angular...

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Bibliographic Details
Published in:Quantum electronics (Woodbury, N.Y.) N.Y.), 2012-08, Vol.42 (8), p.739-742
Main Authors: Sokolov, Viktor I, Panchenko, Vladislav Ya, Seminogov, V N
Format: Article
Language:English
Subjects:
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
DIELECTRIC MATERIALS
EXCITATION
MODULATION
QUANTUM ELECTRONICS
REFRACTIVE INDEX
THICKNESS
THIN FILMS
WAVEGUIDES
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Summary:A method is proposed for measuring the refractive index gradient n(z) in nonuniformly thick dielectric films. The method is based on the excitation of waveguide modes in a film using the prism coupling technique and on the calculation of n(z) and film thickness H{sub f} with the help of the angular positions of the TE or TM modes. The method can be used for an arbitrary shape of the index modulation over the film thickness in the limit of a small gradient [{Delta} n(z)/n(z) || 1]. (laser applications and other topics in quantum electronics)
ISSN:1063-7818
1468-4799
DOI:10.1070/QE2012v042n08ABEH014849