Novel plasma immersion ion implantation and deposition hardware and technique based on high power pulsed magnetron discharge

A novel plasma immersion ion implantation technique based on high power pulsed magnetron sputtering (HPPMS) discharge that can produce a high density metal plasma is described. The metal plasma is clean and does not suffer from contamination from macroparticles, and the process can be readily scaled...

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Bibliographic Details
Published in:Review of scientific instruments 2011-03, Vol.82 (3), p.033511-033511-5
Main Authors: Wu, Zhongzhen, Tian, Xiubo, Shi, Jingwei, Wang, Zeming, Gong, Chunzhi, Yang, Shiqin, Chu, Paul K.
Format: Article
Language:English
Subjects:
ADHESION
CHROMIUM NITRIDES
CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
DEPOSITION
ELECTRIC POTENTIAL
ION IMPLANTATION
MAGNETRONS
PLASMA
PLASMA DENSITY
PULSES
SPUTTERING
THIN FILMS
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Description
Summary:A novel plasma immersion ion implantation technique based on high power pulsed magnetron sputtering (HPPMS) discharge that can produce a high density metal plasma is described. The metal plasma is clean and does not suffer from contamination from macroparticles, and the process can be readily scaled up for industrial production. The hardware, working principle, and operation modes are described. A matching circuit is developed to modulate the high-voltage and HPPMS pulses to enable operation under different modes such as simultaneous implantation and deposition, pure implantation, and selective implantation. To demonstrate the efficacy of the system and technique, CrN films with a smooth and dense surface without macroparticles were produced. An excellent adhesion with a critical load of 59.9 N is achieved for the pure implantation mode.
ISSN:0034-6748
1089-7623
DOI:10.1063/1.3565175