Fabrication and characterization of nanometric SiOx/SiOy multilayer structures obtained by LPCVD

This work presents the fabrication of nanometric multilayer structures and their characterization by Atomic Force Microscopy, Photoluminescence and Fourier Transform Infra Red spectroscopy. The structures were deposited by Low Pressure Chemical Vapor Deposition (LPCVD). Three types of multilayer str...

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Bibliographic Details
Main Authors: Román-López, S, Aceves-Mijares, M, Carrillo-López, J, Pedraza-Chávez, J
Format: Conference Proceeding
Language:English
Subjects:
ABSORPTION SPECTROSCOPY
ANNEALING
Atomic force microscopy
CHEMICAL VAPOR DEPOSITION
EMISSION SPECTROSCOPY
FABRICATION
FOURIER TRANSFORMATION
Fourier transforms
LAYERS
Low pressure
Multilayers
NANOSCIENCE AND NANOTECHNOLOGY
NANOSTRUCTURES
Organic chemistry
PHOTOLUMINESCENCE
PRESSURE DEPENDENCE
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Summary:This work presents the fabrication of nanometric multilayer structures and their characterization by Atomic Force Microscopy, Photoluminescence and Fourier Transform Infra Red spectroscopy. The structures were deposited by Low Pressure Chemical Vapor Deposition (LPCVD). Three types of multilayer structure were fabricated. After the deposition some samples were annealed in N2 ambient for three hours. It was found that the structures keep the characteristics of each layer.
ISSN:0094-243X
1551-7616
DOI:10.1063/1.4878276