Local droplet etching – Nanoholes, quantum dots, and air-gap heterostructures

Local droplet etching (LDE) allows the self-organized generation of nanoholes in semiconductor surfaces and is fully compatible with molecular beam epitaxy (MBE). The influence of the process parameters as well as of droplet and substrate materials on the LDE nanohole morphology is discussed. Furthe...

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Bibliographic Details
Main Authors: Heyn Ch, Sonnenberg, D, Graf, A, Kerbst, J, Stemmann, A, Hansen, W
Format: Conference Proceeding
Language:English
Subjects:
AIR
Air gaps
DROPLETS
Electrons
ETCHING
FABRICATION
HETEROJUNCTIONS
Heterostructures
HOLES
MOLECULAR BEAM EPITAXY
MORPHOLOGY
NANOSCIENCE AND NANOTECHNOLOGY
Process parameters
QUANTUM DOTS
SEMICONDUCTOR MATERIALS
SUBSTRATES
SURFACES
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Summary:Local droplet etching (LDE) allows the self-organized generation of nanoholes in semiconductor surfaces and is fully compatible with molecular beam epitaxy (MBE). The influence of the process parameters as well as of droplet and substrate materials on the LDE nanohole morphology is discussed. Furthermore, recent applications of LDE, the fabrication of quantum dots by hole filling and the creation of air-gap heterostructures are addressed.
ISSN:0094-243X
1551-7616
DOI:10.1063/1.4878285