Nanoscale patterning of graphene through femtosecond laser ablation

We report on nanometer-scale patterning of single layer graphene on SiO2/Si substrate through femtosecond laser ablation. The pulse fluence is adjusted around the single-pulse ablation threshold of graphene. It is shown that, even though both SiO2 and Si have more absorption in the linear regime com...

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Bibliographic Details
Published in:Applied physics letters 2014-02, Vol.104 (5)
Main Authors: Sahin, R., Simsek, E., Akturk, S.
Format: Article
Language:English
Subjects:
ABLATION
Applied physics
Channels
COMPARATIVE EVALUATIONS
CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
Electron microscopes
Femtosecond pulsed lasers
Fluence
GRAPHENE
HETEROJUNCTIONS
Laser ablation
LASER RADIATION
Lasers
NANOSCIENCE AND NANOTECHNOLOGY
NANOSTRUCTURES
Periodic structures
PULSES
RAMAN SPECTROSCOPY
Raster scanning
SCANNING ELECTRON MICROSCOPY
Shielding
SILICON
Silicon dioxide
SILICON OXIDES
Silicon substrates
SUBSTRATES
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Summary:We report on nanometer-scale patterning of single layer graphene on SiO2/Si substrate through femtosecond laser ablation. The pulse fluence is adjusted around the single-pulse ablation threshold of graphene. It is shown that, even though both SiO2 and Si have more absorption in the linear regime compared to graphene, the substrate can be kept intact during the process. This is achieved by scanning the sample under laser illumination at speeds yielding a few numbers of overlapping pulses at a certain point, thereby effectively shielding the substrate. By adjusting laser fluence and translation speed, 400 nm wide ablation channels could be achieved over 100 μm length. Raster scanning of the sample yields well-ordered periodic structures, provided that sufficient gap is left between channels. Nanoscale patterning of graphene without substrate damage is verified with Scanning Electron Microscope and Raman studies.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4864616