Combination of grazing incidence x-ray fluorescence with x-ray reflectivity in one table-top spectrometer for improved characterization of thin layer and implants on/in silicon wafers

• Published in: Review of scientific instruments 2014-08, Vol.85 (8), p.083110-083110
• Main Authors: Ingerle, D, Schiebl, M, Streli, C, Wobrauschek, P
• Format: Article
• Language: English
• Subjects: BEAMS; GONIOMETERS; Grazing incidence; Hafnium oxide; HAFNIUM OXIDES; Implants; INCIDENCE ANGLE; INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; LI-DRIFTED DETECTORS; PENETRATION DEPTH; Reflectance; REFLECTIVITY; Scientific apparatus & instruments; Silicon; Silicon wafers; SPECTROMETERS; THIN FILMS; Wafers; X RADIATION; X ray fluorescence analysis; X ray spectra
• ISSN: 0034-6748; 1089-7623
• DOI: 10.1063/1.4893383

As Grazing Incidence X-ray Fluorescence (GIXRF) analysis does not provide unambiguous results for the characterization of nanometre layers as well as nanometre depth profiles of implants in silicon wafers by its own, the approach of providing additional information using the signal from X-ray Reflectivity (XRR) was tested. As GIXRF already uses an X-ray beam impinging under grazing incidence and the variation of the angle of incidence, a GIXRF spectrometer was adapted with an XRR unit to obtain data from the angle dependent fluorescence radiation as well as data from the reflected beam. A θ-2θ goniometer was simulated by combining a translation and tilt movement of a Silicon Drift detector, which allows detecting the reflected beam over 5 orders of magnitude. HfO2 layers as well as As implants in Silicon wafers in the nanometre range were characterized using this new setup. A just recently published combined evaluation approach was used for data evaluation.