High power pulsed magnetron sputtering: A method to increase deposition rate

High power pulsed magnetron sputtering (HPPMS) is a state-of-the-art physical vapor deposition technique with several industrial applications. One of the main disadvantages of this process is its low deposition rate. In this work, the authors report a new magnetic field configuration, which produces...

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Bibliographic Details
Published in:Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2015-05, Vol.33 (3)
Main Authors: Raman, Priya, Shchelkanov, Ivan A., McLain, Jake, Ruzic, David N
Format: Article
Language:English
Subjects:
DESIGN
EFFICIENCY
ENGINEERING
EROSION
MAGNETIC FIELD CONFIGURATIONS
MAGNETIC FIELDS
MAGNETRONS
MAGNETS
PHYSICAL VAPOR DEPOSITION
POWER SUPPLIES
SPUTTERING
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Summary:High power pulsed magnetron sputtering (HPPMS) is a state-of-the-art physical vapor deposition technique with several industrial applications. One of the main disadvantages of this process is its low deposition rate. In this work, the authors report a new magnetic field configuration, which produces deposition rates twice that of conventional magnetron's dipole magnetic field configuration. Three different magnet pack configurations are discussed in this paper, and an optimized magnet pack configuration for HPPMS that leads to a higher deposition rate and nearly full-face target erosion is presented. The discussed magnetic field produced by a specially designed magnet assembly is of the same size as the conventional magnet assembly and requires no external fields. Comparison of deposition rates with different power supplies and the electron trapping efficiency in complex magnetic field arrangements are discussed.
ISSN:0734-2101
1520-8559
DOI:10.1116/1.4916108