Structural and magnetic properties of epitaxial delafossite CuFeO{sub 2} thin films grown by pulsed laser deposition

Growth of pure phase delafossite CuFeO{sub 2} thin films on Al{sub 2}O{sub 3} (00.1) substrates by pulsed laser deposition was systematically investigated as a function of growth temperature and oxygen pressure. X-ray diffraction, transmission electron microscopy, Raman scattering, and x-ray absorpt...

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Bibliographic Details
Published in:Journal of applied physics 2015-01, Vol.117 (1)
Main Authors: Joshi, Toyanath, Senty, Tess R., Trappen, Robbyn, Zhou, Jinling, Borisov, Pavel, Holcomb, Mikel B., Bristow, Alan D., Lederman, David, Chen, Song, Song, Xueyan, Ferrari, Piero, Cabrera, Alejandro L.
Format: Article
Language:English
Subjects:
ABSORPTION SPECTROSCOPY
ALUMINIUM OXIDES
ANTIFERROMAGNETISM
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
COPPER COMPOUNDS
CRYSTAL GROWTH
ENERGY BEAM DEPOSITION
EPITAXY
INFRARED SPECTRA
IRON OXIDES
LASER RADIATION
MAGNETIC PROPERTIES
MAGNETIZATION
PHASE TRANSFORMATIONS
PULSED IRRADIATION
RAMAN EFFECT
TEMPERATURE DEPENDENCE
THIN FILMS
TRANSMISSION ELECTRON MICROSCOPY
X-RAY DIFFRACTION
X-RAY SPECTROSCOPY
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Summary:Growth of pure phase delafossite CuFeO{sub 2} thin films on Al{sub 2}O{sub 3} (00.1) substrates by pulsed laser deposition was systematically investigated as a function of growth temperature and oxygen pressure. X-ray diffraction, transmission electron microscopy, Raman scattering, and x-ray absorption spectroscopy confirmed the existence of the delafossite phase. Infrared reflectivity spectra determined a band edge at 1.15 eV, in agreement with the bulk delafossite data. Magnetization measurements on CuFeO{sub 2} films demonstrated a phase transition at T{sub C} ≈ 15 ± 1 K, which agrees with the first antiferromagnetic transition at 14 K in the bulk CuFeO{sub 2}. Low temperature magnetic phase is best described by commensurate, weak ferromagnetic spin ordering along the c-axis.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.4905424