Coexistence of colossal stress and texture gradients in sputter deposited nanocrystalline ultra-thin metal films

This paper demonstrates experimentally that ultra-thin, nanocrystalline films can exhibit coexisting colossal stress and texture depth gradients. Their quantitative determination is possible by X-ray diffraction experiments. Whereas a uniform texture by itself is known to generally cause curvature i...

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Bibliographic Details
Published in:Applied physics letters 2014-12, Vol.105 (22)
Main Authors: Kuru, Yener, Welzel, Udo, Mittemeijer, Eric J.
Format: Article
Language:English
Subjects:
Applied physics
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
CRYSTALS
Curvature
DEPOSITS
Metal films
Nanocrystals
NANOSCIENCE AND NANOTECHNOLOGY
NANOSTRUCTURES
SPUTTERING
STRESSES
TEXTURE
Thin films
TUNGSTEN
X-RAY DIFFRACTION
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Summary:This paper demonstrates experimentally that ultra-thin, nanocrystalline films can exhibit coexisting colossal stress and texture depth gradients. Their quantitative determination is possible by X-ray diffraction experiments. Whereas a uniform texture by itself is known to generally cause curvature in so-called sin2ψ plots, it is shown that the combined action of texture and stress gradients provides a separate source of curvature in sin2ψ plots (i.e., even in cases where a uniform texture does not induce such curvature). On this basis, the texture and stress depth profiles of a nanocrystalline, ultra-thin (50 nm) tungsten film could be determined.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4902940