Tunable biaxial in-plane compressive strain in a Si nanomembrane transferred on a polyimide film

A method of creating tunable and programmable biaxial compressive strain in silicon nanomembranes (Si NMs) transferred onto a Kapton® HN polyimide film has been demonstrated. The programmable biaxial compressive strain (up to 0.54%) was generated utilizing a unique thermal property exhibited by the...

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Bibliographic Details
Published in:Applied physics letters 2015-05, Vol.106 (21)
Main Authors: Kim, Munho, Mi, Hongyi, Cho, Minkyu, Seo, Jung-Hun, Zhou, Weidong, Gong, Shaoqin, Ma, Zhenqiang
Format: Article
Language:English
Subjects:
ANNEALING
Applied physics
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
Compressive properties
High temperature
Kapton (trademark)
MATERIALS SCIENCE
Mathematical models
NANOSTRUCTURES
POLYAMIDES
Polyimide resins
RAMAN SPECTROSCOPY
SILICON
Strain distribution
STRAINS
Temperature
THERMODYNAMIC PROPERTIES
X ray spectra
X-RAY DIFFRACTION
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Summary:A method of creating tunable and programmable biaxial compressive strain in silicon nanomembranes (Si NMs) transferred onto a Kapton® HN polyimide film has been demonstrated. The programmable biaxial compressive strain (up to 0.54%) was generated utilizing a unique thermal property exhibited by the Kapton HN film, namely, it shrinks from its original size when exposed to elevated temperatures. The correlation between the strain and the annealing temperature was carefully investigated using Raman spectroscopy and high resolution X-ray diffraction. It was found that various amounts of compressive strains can be obtained by controlling the thermal annealing temperatures. In addition, a numerical model was used to evaluate the strain distribution in the Si NM. This technique provides a viable approach to forming in-plane compressive strain in NMs and offers a practical platform for further studies in strain engineering.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4922043