Multicolor generation using silicon nanodisk absorber

A multicolored matrix that spans the visible range was demonstrated by using silicon nanodisk arrays. A nanostructured silicon substrate, which featured periodic silicon nanodisk arrays of various diameters, inter-nanodisk distances, and heights, was fabricated using electron-beam lithography and re...

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Bibliographic Details
Published in:Applied physics letters 2015-02, Vol.106 (8)
Main Authors: Yang, Sheng-Chieh, Richter, Karola, Fischer, Wolf-Joachim
Format: Article
Language:English
Subjects:
Applied physics
Arrays
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
COLOR
Electron beam lithography
ELECTRON BEAMS
ETCHING
FINITE DIFFERENCE METHOD
Ion etching
IONS
Leaky modes
MASKING
NANOSTRUCTURES
Optical properties
PERIODICITY
Reactive ion etching
RED SHIFT
REFLECTION
SILICON
Silicon substrates
SPECTRAL REFLECTANCE
SUBSTRATES
Wave reflection
WAVELENGTHS
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Summary:A multicolored matrix that spans the visible range was demonstrated by using silicon nanodisk arrays. A nanostructured silicon substrate, which featured periodic silicon nanodisk arrays of various diameters, inter-nanodisk distances, and heights, was fabricated using electron-beam lithography and reactive ion etching. These silicon nanodisks were able to support HE1m leaky modes, which depended on the diameter of the nanodisks, resulting in wavelength-dependent reflection spectra. The resonant wavelength redshifted linearly with the increasing nanodisk diameter. The output color lay in the visible range and was observed to be tunable when varying the diameter, interdistance, and height. The results of finite-difference time-domain simulations exhibited close agreement with the observed optical properties of the periodic silicon nanodisk arrays.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4913847