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Hot-electron energy relaxation time in Ga-doped ZnO films

Hot-electron energy relaxation time is deduced for Ga-doped ZnO epitaxial layers from pulsed hot-electron noise measurements at room temperature. The relaxation time increases from ∼0.17 ps to ∼1.8 ps when the electron density increases from 1.4 × 1017 cm−3 to 1.3 × 1020 cm−3. A local minimum is res...

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Bibliographic Details
Published in:Journal of applied physics 2015-02, Vol.117 (6)
Main Authors: Šermukšnis, E., Liberis, J., Ramonas, M., Matulionis, A., Toporkov, M., Liu, H. Y., Avrutin, V., Özgür, Ü., Morkoç, H.
Format: Article
Language:English
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Summary:Hot-electron energy relaxation time is deduced for Ga-doped ZnO epitaxial layers from pulsed hot-electron noise measurements at room temperature. The relaxation time increases from ∼0.17 ps to ∼1.8 ps when the electron density increases from 1.4 × 1017 cm−3 to 1.3 × 1020 cm−3. A local minimum is resolved near an electron density of 1.4 × 1019 cm−3. The longest energy relaxation time (1.8 ps), observed at the highest electron density, is in good agreement with the published values obtained by optical time-resolved luminescence and absorption experiments. Monte Carlo simulations provide a qualitative interpretation of our observations if hot-phonon accumulation is taken into account. The local minimum of the electron energy relaxation time is explained by the ultrafast plasmon-assisted decay of hot phonons in the vicinity of the plasmon–LO-phonon resonance.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.4907907