Atomic layer deposition of ultrathin Cu{sub 2}O and subsequent reduction to Cu studied by in situ x-ray photoelectron spectroscopy

The growth of ultrathin (

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Bibliographic Details
Published in:Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2016-01, Vol.34 (1)
Main Authors: Dhakal, Dileep, Assim, Khaybar, Lang, Heinrich, Bruener, Philipp, Grehl, Thomas, Georgi, Colin, Waechtler, Thomas, Ecke, Ramona, Schulz, Stefan E., Gessner, Thomas
Format: Article
Language:English
Subjects:
ATOMIC FORCE MICROSCOPY
CARBON MONOXIDE
CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
COPPER OXIDES
DEPOSITION
DOPED MATERIALS
ENGINEERING
LAYERS
PRECURSOR
REDUCING AGENTS
REDUCTION
ROUGHNESS
SCATTERING
SENSITIVITY
SILICON OXIDES
SPUTTERING
SUBSTRATES
SURFACES
THIN FILMS
X-RAY PHOTOELECTRON SPECTROSCOPY
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Description
Summary:The growth of ultrathin (
ISSN:0734-2101
1520-8559
DOI:10.1116/1.4933088