Perpendicular coercivity enhancement of CoPt/TiN films by nitrogen incorporation during deposition

The effect of N incorporation on the structure and magnetic properties of CoPt thin films deposited on glass substrates with TiN seed layers has been investigated. During the deposition of CoPt, introducing 20% N2 into Ar atmosphere promotes the (001) texture and enhances the perpendicular coercivit...

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Bibliographic Details
Published in:Journal of applied physics 2015-11, Vol.118 (20)
Main Authors: An, Hongyu, Wang, Jian, Szivos, Janos, Harumoto, Takashi, Sannomiya, Takumi, Muraishi, Shinji, Safran, Gyorgy, Nakamura, Yoshio, Shi, Ji
Format: Article
Language:English
Subjects:
ANNEALING
Applied physics
ARGON
Cobalt base alloys
COBALT COMPOUNDS
COERCIVE FORCE
Coercivity
CONTROLLED ATMOSPHERES
DEPOSITION
Epitaxial growth
GLASS
Glass substrates
Incorporation
Intermetallic compounds
LATTICE PARAMETERS
MAGNETIC PROPERTIES
MATERIALS SCIENCE
NITROGEN
PLATINUM COMPOUNDS
TEXTURE
THIN FILMS
Titanium nitride
TITANIUM NITRIDES
X-RAY DIFFRACTION
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Summary:The effect of N incorporation on the structure and magnetic properties of CoPt thin films deposited on glass substrates with TiN seed layers has been investigated. During the deposition of CoPt, introducing 20% N2 into Ar atmosphere promotes the (001) texture and enhances the perpendicular coercivity of CoPt film compared with the film deposited in pure Ar and post-annealed under the same conditions. From the in situ x-ray diffraction results, it is confirmed that N incorporation expands the lattice parameter of CoPt, which favors the epitaxial growth of CoPt on TiN. During the post-annealing process, N releases from CoPt film and promotes the L10 ordering transformation of CoPt.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.4936365