Effects of oxygen plasma etching on Sb{sub 2}Te{sub 3} explored by torque detected quantum oscillations

De Haas–van Alphen measurements evidence that oxygen plasma etching strongly affects the properties of the three-dimensional topological insulator Sb{sub 2}Te{sub 3}. The quantum oscillations in magnetization down to low temperature (T ≥ 2 K) and high magnetic field (B ≤ 7 T) have been systematicall...

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Bibliographic Details
Published in:Applied physics letters 2016-04, Vol.108 (17)
Main Authors: Yan, Yuan, Heintze, Eric, Pracht, Uwe S., Blankenhorn, Marian, Dressel, Martin
Format: Article
Language:English
Subjects:
ANTIMONY TELLURIDES
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
EFFECTIVE MASS
ETCHING
MAGNETIC FIELDS
MAGNETIZATION
MAGNETOMETERS
OSCILLATIONS
OXYGEN
PLASMA
SENSITIVITY
SURFACES
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Summary:De Haas–van Alphen measurements evidence that oxygen plasma etching strongly affects the properties of the three-dimensional topological insulator Sb{sub 2}Te{sub 3}. The quantum oscillations in magnetization down to low temperature (T ≥ 2 K) and high magnetic field (B ≤ 7 T) have been systematically investigated using a high-sensitive cantilever torque magnetometer. The effective mass and the oscillation frequency obtained from de Haas–van Alphen measurements first increase and then decrease as the oxygen plasma etching time increases from 0 to 12 min, corresponding to an up- and down-shift of the Dirac point. We establish the cantilever torque magnetometer as a powerful contactless tool to investigate the oxygen sensitivity of the surface state in topological insulators.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4948345