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Measurement of the thickness of block-structured bismuth films by atomic-force microscopy combined with selective chemical etching

A method for measuring the thickness of block-structured films by atomic-force microscopy and selective chemical etching is proposed. The method is tested for thin bismuth films formed on mica by thermal evaporation in vacuum.

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Bibliographic Details
Published in:Semiconductors (Woodbury, N.Y.) N.Y.), 2017-07, Vol.51 (7), p.840-842
Main Authors: Demidov, E. V., Komarov, V. A., Krushelnitckii, A. N., Suslov, A. V.
Format: Article
Language:English
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Summary:A method for measuring the thickness of block-structured films by atomic-force microscopy and selective chemical etching is proposed. The method is tested for thin bismuth films formed on mica by thermal evaporation in vacuum.
ISSN:1063-7826
1090-6479
DOI:10.1134/S1063782617070065