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Measurement of the thickness of block-structured bismuth films by atomic-force microscopy combined with selective chemical etching
A method for measuring the thickness of block-structured films by atomic-force microscopy and selective chemical etching is proposed. The method is tested for thin bismuth films formed on mica by thermal evaporation in vacuum.
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Published in: | Semiconductors (Woodbury, N.Y.) N.Y.), 2017-07, Vol.51 (7), p.840-842 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | A method for measuring the thickness of block-structured films by atomic-force microscopy and selective chemical etching is proposed. The method is tested for thin bismuth films formed on mica by thermal evaporation in vacuum. |
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ISSN: | 1063-7826 1090-6479 |
DOI: | 10.1134/S1063782617070065 |