Manufacturing of Sputtering Composite Targets Containing Phases of Co{sub 2}FeSi or Co{sub 2}MnSi Heusler Alloy

The paper presents a method for manufacturing mechanically strong sputtering composite targets containing the phase of the Co{sub 2}FeSi or Co{sub 2}MnSi Heusler alloy of the stoichiometric composition, which can be used for fabrication of spin electronic devices by high-frequency magnetron depositi...

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Bibliographic Details
Published in:Technical physics 2018-07, Vol.63 (7)
Main Authors: Demidov, E. S., Sdobnyakov, V. V., Vazenmiller, G. V., Chigirinskii, Yu. I., Dudin, Yu. A., Lesnikov, V. P., Trushin, V. N., Boldin, M. S., Belkin, O. A., Bobrov, A. A., Sakharov, N. V.
Format: Article
Language:English
Subjects:
COBALT COMPOUNDS
CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
ENERGY BEAM DEPOSITION
FABRICATION
HEUSLER ALLOYS
IRON COMPOUNDS
LASER RADIATION
MAGNETRONS
MANGANESE COMPOUNDS
PULSED IRRADIATION
SILICIDES
SPIN
STOICHIOMETRY
THIN FILMS
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Summary:The paper presents a method for manufacturing mechanically strong sputtering composite targets containing the phase of the Co{sub 2}FeSi or Co{sub 2}MnSi Heusler alloy of the stoichiometric composition, which can be used for fabrication of spin electronic devices by high-frequency magnetron deposition and pulsed laser deposition of thin films.
ISSN:1063-7842
1090-6525
DOI:10.1134/S1063784218070095