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Antisite Defects in Ge–Te and Ge–As–Te Semiconductor Glasses
The formation of antisite defects in Ge 20 Te 80 and Ge 15 As 4 Te 81 vitreous alloys in the form of tin atoms in tellurium sites and tellurium atoms in germanium sites is shown by emission Mössbauer spectroscopy with the 119 mm Sn( 119 m Sn), 119 m Te( 119 m Sn), 125 Sn( 125 Te), and 125 m Te( 125...
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Published in: | Semiconductors (Woodbury, N.Y.) N.Y.), 2019-05, Vol.53 (5), p.711-716 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The formation of antisite defects in Ge
20
Te
80
and Ge
15
As
4
Te
81
vitreous alloys in the form of tin atoms in tellurium sites and tellurium atoms in germanium sites is shown by emission Mössbauer spectroscopy with the
119
mm
Sn(
119
m
Sn),
119
m
Te(
119
m
Sn),
125
Sn(
125
Te), and
125
m
Te(
125
Te) isotopes. It is shown that the isovalent substitution of germanium atoms by tin atoms does not vary the symmetry of the local surrounding of germanium sites, while tin and tellurium atoms reconstruct their local surrounding in sites unnatural for them. |
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ISSN: | 1063-7826 1090-6479 |
DOI: | 10.1134/S1063782619050166 |