Effects of Different Variants of Plasma Nitriding on the Properties of the Nitrided Layer

Several process variants of plasma nitriding can be distinguished depending on the location of the voltage introduction. The aim of this study is to compare three different variants of plasma nitriding (DC plasma nitriding, active screen plasma nitriding, and active screening process with bias volta...

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Bibliographic Details
Published in:Journal of materials engineering and performance 2019-09, Vol.28 (9), p.5485-5493
Main Authors: Kovács, Dorina, Quintana, Iban, Dobránszky, János
Format: Article
Language:English
Subjects:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
Characterization and Evaluation of Materials
Chemistry and Materials Science
Corrosion and Coatings
ELECTRIC POTENTIAL
Engineering Design
GADOLINIUM OXIDES
GLOW DISCHARGES
LAYERS
MATERIALS SCIENCE
PLASMA
Quality Control
Reliability
Safety and Risk
SCANNING ELECTRON MICROSCOPY
SCREENING
SCREENS
Tribology
X RADIATION
X-RAY DIFFRACTOMETERS
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Summary:Several process variants of plasma nitriding can be distinguished depending on the location of the voltage introduction. The aim of this study is to compare three different variants of plasma nitriding (DC plasma nitriding, active screen plasma nitriding, and active screening process with bias voltage application) extended by the study of the coverage of active screen on C45E unalloyed steel, using two different N 2 -H 2 gas mixtures. The thickness of the compound layer was measured using a scanning electron microscope, the phase analysis was performed by an x-ray diffractometer, and the nitrogen contents were analyzed by glow discharge optical electron spectroscopy. The results showed that the layer thickness and the surface hardness were higher by using active screen-biased plasma nitriding with high N 2 content gas mixture. Besides, the lid of the active screen did not influence significantly the chemical composition of the compound layer.
ISSN:1059-9495
1544-1024
DOI:10.1007/s11665-019-04292-9