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Evolution of order in thin block copolymer films

The organization of thin films of symmetric poly(styrene-b-methyl methacrylate) diblock copolymers on silicon is investigated by neutron and X-ray reflectivity. The surface and internal structure as a function of annealing time is compared for two sets of films 680 and 800 [angstrom] in thickness. F...

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Bibliographic Details
Published in:Macromolecules 1994-05, Vol.27 (3), p.749-755
Main Authors: Mayes, A. M, Russell, T. P, Bassereau, P, Baker, S. M, Smith, G. S
Format: Article
Language:English
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Summary:The organization of thin films of symmetric poly(styrene-b-methyl methacrylate) diblock copolymers on silicon is investigated by neutron and X-ray reflectivity. The surface and internal structure as a function of annealing time is compared for two sets of films 680 and 800 [angstrom] in thickness. For the thicker films the equilibrium morphology shows no surface features since the film thickness is 2.5L where L is the period of the lamellar microdomain morphology. The thinner films, 2.1L in thickness, exhibit hole formation over 40% of the surface. In both cases the multilayer organization proceeds from the substrate upward by chain transport through channels which perforate the developing layers. For short annealing times a sharp increase in surface roughness is seen, which may linked with the wetting of PMMA-rich surface regions by polystyrene. At longer times these height fluctuations decay or grow into holes, depending on the initial film thickness.
ISSN:0024-9297
1520-5835
DOI:10.1021/ma00081a020