Characterization of Mo/B4C multilayers

The Mo/B4C multilayer system is selected for maximum, normal incidence reflection of 6.7nm x-rays. Application in projection lithography requires structural optimization for smooth layering and minimal interface roughness. A transmission electron microscopy analysis of samples prepared in cross-sect...

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Bibliographic Details
Main Authors: Jankowski, A. F., Perry, P. L.
Format: Conference Proceeding
Language:English
Subjects:
360201 - Ceramics, Cermets, & Refractories- Preparation & Fabrication
360204 - Ceramics, Cermets, & Refractories- Physical Properties
ALLOYS
BORON CARBIDES
BORON COMPOUNDS
CARBIDES
CARBON COMPOUNDS
COATINGS
CRYSTAL STRUCTURE
ELECTRON MICROSCOPY
MATERIALS SCIENCE
MICROSCOPY
MICROSTRUCTURE
MIRRORS
MOLYBDENUM ALLOYS
OPTICAL EQUIPMENT
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
REFLECTIVE COATINGS
REFLECTIVITY
SPUTTERING
SURFACE PROPERTIES
TRANSMISSION ELECTRON MICROSCOPY
X-RAY EQUIPMENT
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Description
Summary:The Mo/B4C multilayer system is selected for maximum, normal incidence reflection of 6.7nm x-rays. Application in projection lithography requires structural optimization for smooth layering and minimal interface roughness. A transmission electron microscopy analysis of samples prepared in cross-section reveals an intrinsic layer roughness despite attempts to refine sputter deposition parameters. The limitations in growth morphology are attributable to interfacial reactivity from inherent phase instability.
ISSN:0040-6090
1879-2731