Mechanisms of passivity of nonequilibrium Al-W alloys

Sputter-deposited Al--W alloys exhibit considerably enhanced resistance to pitting corrosion over a range of pHs extending from pH 0-9.6. Surface analysis showed that although very little oxidized tungsten is found in the passive film at near-neutral pHs, at pH 3 there are comparable amounts of oxid...

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Bibliographic Details
Published in:Journal of the Electrochemical Society 1993-04, Vol.140 (4), p.951-959
Main Authors: DAVIS, G. D, SHAW, B. A, REES, B. J, FERRY, M
Format: Article
Language:English
Subjects:
360105 - Metals & Alloys- Corrosion & Erosion
ALKALI METAL COMPOUNDS
ALLOYS
ALUMINIUM ALLOYS
ALUMINIUM COMPOUNDS
ALUMINIUM OXIDES
Applied sciences
CHALCOGENIDES
CHEMICAL REACTIONS
CHLORIDES
CHLORINE COMPOUNDS
COHERENT SCATTERING
COMPUTER CODES
CORROSION
Corrosion mechanisms
CORROSION RESISTANCE
DIFFRACTION
ELECTRON MICROSCOPY
ELECTRON SPECTROSCOPY
Exact sciences and technology
HALIDES
HALOGEN COMPOUNDS
MATERIALS SCIENCE
MATHEMATICAL MODELS
Metals. Metallurgy
MICROSCOPY
OXIDES
OXYGEN COMPOUNDS
PASSIVATION
PH VALUE
PHOTOELECTRON SPECTROSCOPY
PITTING CORROSION
POTASSIUM CHLORIDES
POTASSIUM COMPOUNDS
REFRACTORY METAL COMPOUNDS
S CODES
SCANNING ELECTRON MICROSCOPY
SCATTERING
SPECTROSCOPY
SURFACE PROPERTIES
TRANSITION ELEMENT COMPOUNDS
TUNGSTEN ALLOYS
TUNGSTEN COMPOUNDS
TUNGSTEN OXIDES
X-RAY DIFFRACTION
X-RAY SPECTROSCOPY
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Description
Summary:Sputter-deposited Al--W alloys exhibit considerably enhanced resistance to pitting corrosion over a range of pHs extending from pH 0-9.6. Surface analysis showed that although very little oxidized tungsten is found in the passive film at near-neutral pHs, at pH 3 there are comparable amounts of oxidized W and aluminum. A review of the different mechanisms proposed to explain the passivity of this class of alloys suggests that the pitting resistance of Al--W is likely to result from inhibition and repassivation of pits due to the stability of oxidized W in low-pH environments as described by the solute-rich interphase model (SRIM).
ISSN:0013-4651
1945-7111
DOI:10.1149/1.2056234