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Model for the Formation of Silicon Carbide from the Pyrolysis of Dichlorodimethylsilane in Hydrogen: II, Silicon Carbide Formation from Silicon and Methane

A model is developed for the deposition of silicon carbide from the pyrolysis of dichlorodimethylsiane in hydrogen, in a tubular reactor at temperatures from 700° to 1100°C and 1.013 × 105 Pa (1 atm) pressure. Concentration of dichlorodimethylsilane varied from 2 to 8 vol%. Gas chromatography was us...

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Bibliographic Details
Published in:Journal of the American Ceramic Society 1993-01, Vol.76 (1), p.49-53
Main Authors: Cagliostro, Domenick E., Riccitiello, Salvatore R.
Format: Article
Language:English
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Summary:A model is developed for the deposition of silicon carbide from the pyrolysis of dichlorodimethylsiane in hydrogen, in a tubular reactor at temperatures from 700° to 1100°C and 1.013 × 105 Pa (1 atm) pressure. Concentration of dichlorodimethylsilane varied from 2 to 8 vol%. Gas chromatography was used to determine the volatile products of reaction, and gravimetric analysis was used to determine the total silicon and silicon carbide deposition on the tube. The model developed based on the experimental data that assumes the following chemical reactions: The rate constants derived from a nonlinear regression analysis are reported.
ISSN:0002-7820
1551-2916
DOI:10.1111/j.1151-2916.1993.tb03688.x