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Microwave surface resistance of magnetron-sputtered Tl-Ba-Ca-Cu-O films on silver substrates

Surface resistance measurements on Tl-Ba-Ca-Cu-O thick films (∼15 μm) magnetron sputtered onto BaF2-buffered, silver-based (Consil 995) substrates have been made at a microwave frequency of 22 GHz. The relatively large-area films (∼5 cm2) are characterized by surface resistance values of 6.9±2 mΩ at...

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Bibliographic Details
Published in:Applied physics letters 1990-05, Vol.56 (21), p.2147-2149
Main Authors: COOKE, D. W, GRAY, E. R, ARENDT, P. N, REEVES, G. A, HOULTON, R. J, ELLIOTT, N. E, BROWN, D. R
Format: Article
Language:English
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Summary:Surface resistance measurements on Tl-Ba-Ca-Cu-O thick films (∼15 μm) magnetron sputtered onto BaF2-buffered, silver-based (Consil 995) substrates have been made at a microwave frequency of 22 GHz. The relatively large-area films (∼5 cm2) are characterized by surface resistance values of 6.9±2 mΩ at 11.3 K and 30.2±1 mΩ at 77 K; the corresponding values for Cu are 10 and 22 mΩ, respectively. These results demonstrate that Tl-Ba-Ca-Cu-O can be deposited onto large-area, metallic substrates with characteristic surface resistance values lower than Cu at 4 K. Orientation of the film should improve the surface resistance at 77 K, thereby making the fabrication of microwave cavities that are superior to Cu possible.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.102954