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Microwave surface resistance of magnetron-sputtered Tl-Ba-Ca-Cu-O films on silver substrates
Surface resistance measurements on Tl-Ba-Ca-Cu-O thick films (∼15 μm) magnetron sputtered onto BaF2-buffered, silver-based (Consil 995) substrates have been made at a microwave frequency of 22 GHz. The relatively large-area films (∼5 cm2) are characterized by surface resistance values of 6.9±2 mΩ at...
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Published in: | Applied physics letters 1990-05, Vol.56 (21), p.2147-2149 |
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Main Authors: | , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Surface resistance measurements on Tl-Ba-Ca-Cu-O thick films (∼15 μm) magnetron sputtered onto BaF2-buffered, silver-based (Consil 995) substrates have been made at a microwave frequency of 22 GHz. The relatively large-area films (∼5 cm2) are characterized by surface resistance values of 6.9±2 mΩ at 11.3 K and 30.2±1 mΩ at 77 K; the corresponding values for Cu are 10 and 22 mΩ, respectively. These results demonstrate that Tl-Ba-Ca-Cu-O can be deposited onto large-area, metallic substrates with characteristic surface resistance values lower than Cu at 4 K. Orientation of the film should improve the surface resistance at 77 K, thereby making the fabrication of microwave cavities that are superior to Cu possible. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.102954 |