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Noise in a-Si:H p-i-n detector diodes
Noise of a-Si:H p-i-n diodes (5 approximately 50 mu m thick) under reverse bias was investigated. The current-dependent 1/f type noise was found to be the main noise component at high bias. At low bias the thermal noise from a series resistance of the p-layer and the metallic contacts was the domina...
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Published in: | IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) 1992-08, Vol.39 (4), p.641-644 |
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container_title | IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) |
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creator | Cho, G. Qureshi, S. Drewery, J.S. Jing, T. Kaplan, S.N. Lee, H. Mireshghi, A. Perez-Mendez, V. Wildermuth, D. |
description | Noise of a-Si:H p-i-n diodes (5 approximately 50 mu m thick) under reverse bias was investigated. The current-dependent 1/f type noise was found to be the main noise component at high bias. At low bias the thermal noise from a series resistance of the p-layer and the metallic contacts was the dominant noise source which was unrelated to the reverse current through the diode. The noise associated with the p-layer resistance decreased significantly on annealing under reverse bias, reducing the total zero bias noise by a factor of two, approximately. The noise recovered to the original value on subsequent annealing without bias. In addition to the resistive noise there seemed to be a shaping time-independent noise component at zero biased diodes.< > |
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The current-dependent 1/f type noise was found to be the main noise component at high bias. At low bias the thermal noise from a series resistance of the p-layer and the metallic contacts was the dominant noise source which was unrelated to the reverse current through the diode. The noise associated with the p-layer resistance decreased significantly on annealing under reverse bias, reducing the total zero bias noise by a factor of two, approximately. The noise recovered to the original value on subsequent annealing without bias. 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The current-dependent 1/f type noise was found to be the main noise component at high bias. At low bias the thermal noise from a series resistance of the p-layer and the metallic contacts was the dominant noise source which was unrelated to the reverse current through the diode. The noise associated with the p-layer resistance decreased significantly on annealing under reverse bias, reducing the total zero bias noise by a factor of two, approximately. The noise recovered to the original value on subsequent annealing without bias. In addition to the resistive noise there seemed to be a shaping time-independent noise component at zero biased diodes.< ></description><subject>440100 -- Radiation Instrumentation</subject><subject>ANNEALING</subject><subject>Background noise</subject><subject>ELEMENTS</subject><subject>Exact sciences and technology</subject><subject>HEAT TREATMENTS</subject><subject>INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY</subject><subject>Instruments, apparatus, components and techniques common to several branches of physics and astronomy</subject><subject>JUNCTIONS</subject><subject>MATERIALS SCIENCE</subject><subject>MEASURING INSTRUMENTS</subject><subject>Noise measurement</subject><subject>Noise shaping</subject><subject>Other topics in instruments, apparatus, components and techniques common to several branches of physics and astronomy</subject><subject>P-i-n diodes</subject><subject>P-N JUNCTIONS</subject><subject>Physics</subject><subject>PIN photodiodes</subject><subject>Pulse amplifiers</subject><subject>Pulse measurements</subject><subject>Pulse shaping methods</subject><subject>RADIATION DETECTORS</subject><subject>SEMICONDUCTOR DETECTORS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SEMICONDUCTOR DIODES</subject><subject>SEMICONDUCTOR JUNCTIONS</subject><subject>SEMIMETALS 360601 -- Other Materials-- Preparation & Manufacture</subject><subject>SI SEMICONDUCTOR DETECTORS</subject><subject>SILICON</subject><subject>Thermal resistance</subject><issn>0018-9499</issn><issn>1558-1578</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1992</creationdate><recordtype>article</recordtype><recordid>eNqFkE1LxDAQhoMouK4evHoqooKHrDNpPhpvsqgrLHpQzyFNU4x0m7XpHvz3dumiR0_DwDMP77yEnCLMEEHfsHyGQkul98gEhSgoClXskwkAFlRzrQ_JUUqfw8oFiAm5fI4h-Sy0maWv4XaRrWmgbVb53rs-dlkVYuXTMTmobZP8yW5OyfvD_dt8QZcvj0_zuyV1udY91RIc57bUJTgtMYfSAiLztUIB1gpZccs0OCxYqbSToARnpahQSs69zfMpOR-9MfXBJBeGFB8utu0QxkjNcq5ggK5GaN3Fr41PvVmF5HzT2NbHTTKs4Jxxxv4HhVIIqhjA6xF0XUyp87VZd2Flu2-DYLa1GpabsdaBvdhJbXK2qTvbupB-D7hgINj2k7MRC977P93o-AFSpHoh</recordid><startdate>19920801</startdate><enddate>19920801</enddate><creator>Cho, G.</creator><creator>Qureshi, S.</creator><creator>Drewery, J.S.</creator><creator>Jing, T.</creator><creator>Kaplan, S.N.</creator><creator>Lee, H.</creator><creator>Mireshghi, A.</creator><creator>Perez-Mendez, V.</creator><creator>Wildermuth, D.</creator><general>IEEE</general><general>Institute of Electrical and Electronics Engineers</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope><scope>OTOTI</scope></search><sort><creationdate>19920801</creationdate><title>Noise in a-Si:H p-i-n detector diodes</title><author>Cho, G. ; 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(United States)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Cho, G.</au><au>Qureshi, S.</au><au>Drewery, J.S.</au><au>Jing, T.</au><au>Kaplan, S.N.</au><au>Lee, H.</au><au>Mireshghi, A.</au><au>Perez-Mendez, V.</au><au>Wildermuth, D.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Noise in a-Si:H p-i-n detector diodes</atitle><jtitle>IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States)</jtitle><stitle>TNS</stitle><date>1992-08-01</date><risdate>1992</risdate><volume>39</volume><issue>4</issue><spage>641</spage><epage>644</epage><pages>641-644</pages><issn>0018-9499</issn><eissn>1558-1578</eissn><coden>IETNAE</coden><abstract>Noise of a-Si:H p-i-n diodes (5 approximately 50 mu m thick) under reverse bias was investigated. The current-dependent 1/f type noise was found to be the main noise component at high bias. At low bias the thermal noise from a series resistance of the p-layer and the metallic contacts was the dominant noise source which was unrelated to the reverse current through the diode. The noise associated with the p-layer resistance decreased significantly on annealing under reverse bias, reducing the total zero bias noise by a factor of two, approximately. The noise recovered to the original value on subsequent annealing without bias. In addition to the resistive noise there seemed to be a shaping time-independent noise component at zero biased diodes.< ></abstract><cop>New York, NY</cop><pub>IEEE</pub><doi>10.1109/23.159679</doi><tpages>4</tpages><oa>free_for_read</oa></addata></record> |
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subjects | 440100 -- Radiation Instrumentation ANNEALING Background noise ELEMENTS Exact sciences and technology HEAT TREATMENTS INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY Instruments, apparatus, components and techniques common to several branches of physics and astronomy JUNCTIONS MATERIALS SCIENCE MEASURING INSTRUMENTS Noise measurement Noise shaping Other topics in instruments, apparatus, components and techniques common to several branches of physics and astronomy P-i-n diodes P-N JUNCTIONS Physics PIN photodiodes Pulse amplifiers Pulse measurements Pulse shaping methods RADIATION DETECTORS SEMICONDUCTOR DETECTORS SEMICONDUCTOR DEVICES SEMICONDUCTOR DIODES SEMICONDUCTOR JUNCTIONS SEMIMETALS 360601 -- Other Materials-- Preparation & Manufacture SI SEMICONDUCTOR DETECTORS SILICON Thermal resistance |
title | Noise in a-Si:H p-i-n detector diodes |
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