Imaging x-ray multilayer structures using cross-sectional high resolution electron microscopy

Mo/Si soft x-ray multilayer films have been imaged in cross section by high resolution electron microscopy and the dependence of important multilayer parameters on imaging conditions has been investigated. Multiple measurements of the widths of the Mo crystalline layers were made from images recorde...

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Bibliographic Details
Published in:Journal of applied physics 1992-12, Vol.72 (11), p.5165-5171
Main Authors: YUANDA CHENG, SMITH, D. J, STEARNS, M. B, STEARNS, D. G
Format: Article
Language:English
Subjects:
360102 - Metals & Alloys- Structure & Phase Studies
Applied sciences
Condensed matter: structure, mechanical and thermal properties
CROSS SECTIONS
CRYSTAL STRUCTURE
ELECTROMAGNETIC RADIATION
ELECTRON MICROSCOPY
ELEMENTS
Exact sciences and technology
GRAIN ORIENTATION
IONIZING RADIATIONS
LAYERS
Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties
MATERIALS SCIENCE
METALS
Metals. Metallurgy
MICROSCOPY
MICROSTRUCTURE
MOLYBDENUM
ORIENTATION
Physics
RADIATIONS
SEMIMETALS
SILICON
SOFT X RADIATION
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
TRANSITION ELEMENTS
TRANSMISSION ELECTRON MICROSCOPY
X RADIATION
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Summary:Mo/Si soft x-ray multilayer films have been imaged in cross section by high resolution electron microscopy and the dependence of important multilayer parameters on imaging conditions has been investigated. Multiple measurements of the widths of the Mo crystalline layers were made from images recorded as part of a through-focal series. The layer thicknesses were found to be insensitive to the focus setting near the Scherzer defocus value (+160 Å to −800 Å). At larger defocus conditions, however, additional Mo fringes were visible so that the Mo crystalline region seemed to become thicker at the expense of the pure Si and interlayer regions. Micrographs recorded with the ML slightly tilted (∼1–2°) from the edge-on orientation suggested thicker Mo and thinner Si and interlayer regions but the apparent bilayer periodicity did not change measurably. The possibility of changes in multilayer structure induced during cross-sectional specimen preparation was also shown. Finally, the results of the image analysis are compared with those obtained from small and large angle x-ray scattering experiments from the same sample.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.351996