Use of Au-In-Pd and Pd-In Electroless Deposits for Ohmic Contacts on n-GaAs

Deposition in acidic solutions using hydroxylamine as the reductant provided low resistance (6 multiplied by 10- sup 6 OMEGA cm sup 2 ) when annealed at 500 degrees C.

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Bibliographic Details
Published in:Journal of the Electrochemical Society 1990, Vol.137 (1), p.256-259
Main Author: Stremsdoerfer, G.
Format: Article
Language:English
Subjects:
360101 - Metals & Alloys- Preparation & Fabrication
360601 - Other Materials- Preparation & Manufacture
400201 - Chemical & Physicochemical Properties
ALLOYS
ANNEALING
ARSENIC COMPOUNDS
ARSENIDES
CHEMICAL REACTION KINETICS
COPRECIPITATION
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
GOLD ALLOYS
HEAT TREATMENTS
INDIUM ALLOYS
INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY
KINETICS
MATERIALS
MATERIALS SCIENCE
N-TYPE CONDUCTORS
PALLADIUM ALLOYS
PLATINUM METAL ALLOYS
PNICTIDES
PRECIPITATION
REACTION KINETICS
SEMICONDUCTOR MATERIALS
SEPARATION PROCESSES
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Description
Summary:Deposition in acidic solutions using hydroxylamine as the reductant provided low resistance (6 multiplied by 10- sup 6 OMEGA cm sup 2 ) when annealed at 500 degrees C.
ISSN:0013-4651
1945-7111
DOI:10.1149/1.2086378