Fabrication of microlasers and microresonator optical switches

We have microfabricated low-threshold, high-speed vertical-cavity lasers and optical switches by optimizing the mirror design, crystal growth, and ion etching of microresonators. By minimizing the sidewall ion damage in electrically pumped microlasers, we have defined large arrays of 3-μm-diam surfa...

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Bibliographic Details
Published in:Applied physics letters 1989-12, Vol.55 (26), p.2724-2726
Main Authors: SCHERER, A, JEWELL, J. L, LEE, Y. H, HARBISON, J. P, FLOREZ, L. T
Format: Article
Language:English
Subjects:
ALUMINIUM ARSENIDES
ALUMINIUM COMPOUNDS
ARSENIC COMPOUNDS
ARSENIDES
BEAMS
DATA
ELECTRICAL EQUIPMENT
ELECTRONIC EQUIPMENT
ENERGY
ENGINEERING
ETCHING
Exact sciences and technology
EXPERIMENTAL DATA
FABRICATION
Fundamental areas of phenomenology (including applications)
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
INFORMATION
ION BEAMS
LASER MIRRORS
LASERS
MICROELECTRONICS
MIRRORS
NUMERICAL DATA
Optics
Physics
PNICTIDES
RESONATORS
SEMICONDUCTOR DEVICES
SEMICONDUCTOR LASERS
Semiconductor lasers
laser diodes
SOLID STATE LASERS
SURFACE FINISHING 426002 > Engineering-- Lasers & Masers-- (1990-)
SWITCHES
THRESHOLD ENERGY
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Summary:We have microfabricated low-threshold, high-speed vertical-cavity lasers and optical switches by optimizing the mirror design, crystal growth, and ion etching of microresonators. By minimizing the sidewall ion damage in electrically pumped microlasers, we have defined large arrays of 3-μm-diam surface-emitting devices with threshold currents below 1.5 mA. Ion beam etching was also used to define 0.5–1.5 μm wide all-optical microresonator switches with recovery times as low as 30 ps and controlling energies as low as 0.6 pJ.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.101935