Synchrotron radiation excited total reflection x-ray fluorescence quantitative analysis of Si wafer by absolute fluorescence intensity calculation

Saved in:
Bibliographic Details
Published in:Materials letters 2001-06, Vol.49 (1)
Main Authors: Shin, N.S., Chang, C.H., Koo, Y.M., Padmore, H.
Format: Article
Language:English
Subjects:
INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY
QUANTITATIVE CHEMICAL ANALYSIS
REFLECTION
SILICON
SYNCHROTRON RADIATION
X-RAY FLUORESCENCE ANALYSIS
X-RAYS SYNCHROTRON TXRF FLUORESCENCE
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:0167-577X
1873-4979
DOI:10.1016/S0167-577X(00)00338-4