Ultrathin vanadium films on Cu(001): structure and magnetism

• Published in: Surface science 2000-03, Vol.449 (1), p.31-42
• Main Authors: Moore, D.P., Ozturk, O., Schumann, F.O., Morton, S.A., Waddill, G.D.
• Format: Article
• Language: English
• Subjects: ADVANCED LIGHT SOURCE; ADVANCED LIGHT SOURCE ALS; Applied sciences; Condensed matter: electronic structure, electrical, magnetic, and optical properties; Condensed matter: structure, mechanical and thermal properties; Exact sciences and technology; Growth; Low energy electron diffraction (LEED); Magnetic properties and materials; Magnetic properties of monolayers and thin films; Magnetic properties of surface, thin films and multilayers; MAGNETISM; Metallic films; Metals. Metallurgy; PARTICLE ACCELERATORS; Photoelectron diffraction; Physics; Structure and morphology; thickness; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thin film structure and morphology; VANADIUM
• ISSN: 0039-6028; 1879-2758
• DOI: 10.1016/S0039-6028(99)01249-2

X-ray photoelectron diffraction (XPD), low energy electron diffraction (LEED), and magnetic linear dichroism in angular distributions of photoelectrons (MLDAD) have been used to study the structural and magnetic properties of V thin films on Cu(001). For room-temperature growth, XPD and LEED data indicate that below 1 monolayer (ML), equivalent V films exhibit a (2×1) structure that evolves to four domains of bcc (110) at coverages above 1 ML. This multi-domain structure produces a LEED pattern often referred to as ‘(3×1)’. This structure persists to V coverages as high as 100 ML, and the LEED and XPD angular scans indicate that V in these films retains the bulk V lattice constant. MLDAD results for 1–5 ML V films at room temperature and at 150 K provide no evidence for in-plane magnetic ordering. Annealing to 450° C results in V clustering at low coverages accompanied by Cu diffusion. For thick V films, the primary affect of annealing is interdiffusion of Cu and V.