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Behaviour of poly-Si1-xGex-gated MOS capacitors under different electrical stress conditions in the direct tunnelling regime

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Bibliographic Details
Published in:Semiconductor science and technology 2001-06, Vol.16 (6), p.478-482
Main Authors: Yousif, M Y A, Willander, M, Lundgren, P, Caymax, M
Format: Article
Language:English
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ISSN:0268-1242
1361-6641
DOI:10.1088/0268-1242/16/6/311