Atomic layer deposition of AlOx for thin film head gap applications

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Bibliographic Details
Published in:Journal of the Electrochemical Society 2001-09, Vol.148 (9), p.G465-G471
Main Authors: PARANJPE, Ajit, GOPINATH, Sanjay, OMSTEAD, Tom, BUBBER, Randhir
Format: Article
Language:English
Subjects:
Applied sciences
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science
rheology
Electronics
Exact sciences and technology
Magnetic devices
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online Access:Get full text
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ISSN:0013-4651
1945-7111
DOI:10.1149/1.1385822