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Annealing of ZrAlxOy ultrathin films on Si in a vacuum or in O2

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Bibliographic Details
Published in:	Journal of the Electrochemical Society 2001, Vol.148 (12), p.G695-G703
Main Authors:	DA ROSA, E. B. O, MORAIS, J, PEZZI, R. P, MIOTTI, L, BAUMVOL, I. J. R
Format:	Article
Language:	English
Subjects:	Applied sciences Electronics Exact sciences and technology Miscellaneous Semiconductor devices Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online Access:	Get full text
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