X-ray reflectivity characterization of ZnO/Al2O3multilayers prepared by atomic layer deposition

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Bibliographic Details
Published in:Chemistry of materials 2002, Vol.14 (5), p.2276-2282
Main Authors: JENSEN, J. M, OELKERS, A. B, TOIVOLA, R, JOHNSON, D. C, ELAM, J. W, GEORGE, S. M
Format: Article
Language:English
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
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ISSN:0897-4756
1520-5002