Nanoimprinted passive optical devices

We report on the feasibility and process parameters of nanoimprint lithography to fabricate low refractive index passive optical devices. Diffraction gratings printed in PMMA exhibit a sharp dispersion with a full width at half maximum of about 20 nm. Waveguides were printed in polystyrene (PS) on s...

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Bibliographic Details
Published in:Nanotechnology 2002-10, Vol.13 (5), p.581-586
Main Authors: Seekamp, J, Zankovych, S, Helfer, A H, Maury, P, Torres, C M Sotomayor, Böttger, G, Liguda, C, Eich, M, Heidari, B, Montelius, L, Ahopelto, J
Format: Article
Language:English
Subjects:
Applied sciences
Circuit properties
Electric, optical and optoelectronic circuits
Electronics
Engineering and Technology
Exact sciences and technology
Fabrication techniques
lithography, pattern transfer
Integrated optics. Optical fibers and wave guides
Nano Technology
Nanoteknik
Optical and optoelectronic circuits
Teknik
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Summary:We report on the feasibility and process parameters of nanoimprint lithography to fabricate low refractive index passive optical devices. Diffraction gratings printed in PMMA exhibit a sharp dispersion with a full width at half maximum of about 20 nm. Waveguides were printed in polystyrene (PS) on silicon oxide and had losses between 8 and 20 dB/cm at wavelengths between 650 and 400 nm, respectively. Finally, 1D photonic structures were also printed in PS and their transmission and morphology characterized. The expected Bragg peak was observed in transmission, and atomic force microscopy images have shown a good pattern transfer. A square lattice was printed in PMMA and more than 40 print cycles were obtained, i.e., potentially more than 1000 imprints from one master stamp. (Author)
ISSN:0957-4484
1361-6528
DOI:10.1088/0957-4484/13/5/307