Deposition of silicon dioxide films with a non-equilibrium atmospheric-pressure plasma jet

Saved in:
Bibliographic Details
Published in:Plasma sources science & technology 2001-11, Vol.10 (4), p.573-578
Main Authors: Babayan, S E, Jeong, J Y, Schütze, A, Tu, V J, Moravej, Maryam, Selwyn, G S, Hicks, R F
Format: Article
Language:English
Subjects:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ATMOSPHERIC PRESSURE
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science
rheology
DEPOSITION
ENVIRONMENTAL SCIENCES
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma applications
PLASMA JETS
SILICON
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:0963-0252
1361-6595
DOI:10.1088/0963-0252/10/4/305