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Interfacial reactions between lead-free SnAgCu solder and Ni(P) surface finish on printed circuit boards

Transmission electron microscopy and scanning electron microscopy were employed to analyze the interfacial microstructure between Sn-Ag-Cu solder alloys and Ni(P)/Au metallizations. The intermetallic compound Cu/sub 6/Sn/sub 5/, containing a small amount of dissolved Ni, was found to form preferenti...

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Bibliographic Details
Published in:IEEE transactions on electronics packaging manufacturing 2002-07, Vol.25 (3), p.162-167
Main Authors: Kejun Zeng, Vuorinen, V., Kivilahti, J.K.
Format: Article
Language:English
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Summary:Transmission electron microscopy and scanning electron microscopy were employed to analyze the interfacial microstructure between Sn-Ag-Cu solder alloys and Ni(P)/Au metallizations. The intermetallic compound Cu/sub 6/Sn/sub 5/, containing a small amount of dissolved Ni, was found to form preferentially on the Ni coating. This compound layer served as a barrier for direct reaction of Sn with the Ni(P) coating. On the Ni(P) side, a nickel phosphide was identified. Thermodynamic evaluation of the Cu-Ni-Sn system was carried out to rationalize the enrichment of Cu at the solder/finish interface. Effects of the interfacial reactions on joint reliability are discussed.
ISSN:1521-334X
1558-0822
DOI:10.1109/TEPM.2002.801648