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Surface science investigations of atomic layer deposition half-reactions using TaF5 and Si2H6

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Bibliographic Details
Published in:	Surface science 2003-07, Vol.538 (3), p.191-203
Main Authors:	LEMONDS, A. M, WHITE, J. M, EKERDT, J. G
Format:	Article
Language:	English
Subjects:	Adsorption and desorption kinetics evaporation and condensation Chemistry Condensed matter: structure, mechanical and thermal properties Exact sciences and technology General and physical chemistry Physics Solid-fluid interfaces Solid-gas interface Surface physical chemistry Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties)
Online Access:	Get full text
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