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A Passband-Flattened EDG Demultiplexer with an Air-Trenched Taper
A novel passband flattening method for a planar waveguide demultiplexer based on an etched diffraction grating is presented. A strongly confined taper is formed by etching air trenches at both sides of the input waveguide. The geometric parameters of the taper are optimized by considering the figure...
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Published in: | Fiber and integrated optics 2003-01, Vol.22 (6), p.373-383 |
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Main Author: | |
Format: | Article |
Language: | English |
Subjects: | |
Online Access: | Get full text |
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Summary: | A novel passband flattening method for a planar waveguide demultiplexer based on an etched diffraction grating is presented. A strongly confined taper is formed by etching air trenches at both sides of the input waveguide. The geometric parameters of the taper are optimized by considering the figure of merit, ripple, and loss. Numerical simulation for a design example is given to illustrate the passband flattening method. |
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ISSN: | 0146-8030 1096-4681 1096-4681 |
DOI: | 10.1080/01468030390237842 |