Yield impact of cross-field and cross-wafer CD spatial uniformity : Collapse of the deep-UV and 193nm lithographic focus window

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Bibliographic Details
Main Authors: MONAHAN, K, LORD, P, WAIMAN NG, ALTENDORFER, H, KREN, G, ASHKENAZ, S
Format: Conference Proceeding
Language:English
Subjects:
Applied sciences
Design. Technologies. Operation analysis. Testing
Electronics
Exact sciences and technology
Integrated circuits
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online Access:Get full text
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