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Growth of (Ti, Zr)N films on Si by DC reactive sputtering of TiZr in N2/Ar gas mixtures effect of flow ratio

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Bibliographic Details
Published in:	Journal of the Electrochemical Society 2004-03, Vol.151 (3), p.C176-C181
Main Authors:	KUO, Yu-Lin, CHIAPYNG LEE, LAID, Chih-Huang, LIN, Jing-Cheng, PENG, Chao-Hsien, CHEN, Li-Chien, HSIEH, Ching-Hua, SHUE, Shau-Lin, LIANG, Mong-Song, DANIELS, Brian J, HUANG, Cheng-Lin
Format:	Article
Language:	English
Subjects:	Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics Spray coating techniques
Online Access:	Get full text
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