Plasma-enhanced atomic layer deposition of SrTa2O6thin films using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as precursor

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Bibliographic Details
Published in:Journal of the Electrochemical Society 2004, Vol.151 (5), p.C292-C286
Main Authors: SHIN, Woong-Chul, RYU, Sang-Ouk, YOU, In-Kyu, YU, Byoung-Gon, LEE, Won-Jae, CHOI, Kyu-Jeong, YOON, Soon-Gil
Format: Article
Language:English
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
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ISSN:0013-4651
1945-7111