Influence of reactor walls on plasma chemistry and on silicon etch product densities during silicon etching processes in halogen-based plasmas

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Bibliographic Details
Published in:Plasma sources science & technology 2004-08, Vol.13 (3), p.522-530
Main Authors: Cunge, G, Kogelschatz, M, Sadeghi, N
Format: Article
Language:English
Subjects:
Exact sciences and technology
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma applications
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ISSN:0963-0252
1361-6595
DOI:10.1088/0963-0252/13/3/019